M.J.M.Abadie
The target of the electronics industry is to develop miniaturized
systems, i.e., more components for minimum feature size per chip. For microelectronics,
photoresists (negative and positive) active in UV and blue VIS (I-365 and
G-436 nm lines) have been developed. For nanoelectronics, new concept of
chemical amplification coupled to the use of deep UV DUV radiation- excimers
laser (193 nm and 248 nm) has opened a new decisive route to minimize the
resolution
up to the range 150-170 nm. We well review the different photoresists
from the past to the future.