Funct. Mater. 2015; 22 (1): 110-115.

Deagglomeration of aerosil in polishing suspension for chemical-mechanical polishing of sapphire


Institute for Single Crystals, STC ″Institute for Single Crystals″, National Academy of Sciences of Ukraine, 60 Lenin Ave., 61001 Kharkiv, Ukraine


Studied is the influence of pH, surface-active substances and ultrasonic dispersing on the degree of deagglomeration of aerosol in the polishing suspensions used for CMP of sapphire, the removal rate and the optical quality of the surface at polishing. Ultrasonic dispersing makes it possible to obtain silica sol. It is established that the addition of high-molecular compounds with the functional groups OH favors deagglomeration of aerosil, raises the removal rate and allows to obtain the sapphire surface with the optical quality 20/10-40/20 according to the USA standard MIL-0-13830.

sapphire, chemical-mechanical polishing, polishing suspension, silica, aerosil, deagglomeration

1. K.Murakami, T.Oshino, H.Kondo et al., Proc. SPIE, 6921, 69210Q (2008).

2. V.I.Osinskii, T.I.Goncharenko, N.N.Ljahova, PSE, 1, 94 (2003).

3. N.M.Shmidt, A.A.Ankudinov, S.J.Belova et al., Svetodiody i Lasery, 1-2, 38 (2003).

4. J.Cui, A.Sun, M.Reshichkov et al., MRS Internet J. Nitride Semiconductor. Res., 5, e7 (2000).

5. Niu Xin-huan, Liu Yu-ling, Tan Bai-mei, Trans. Nonferrous Met. Sjc. China, 16, s732 (2006).

6. V.V.Rogov, N.D.Rublev, T.L.Krotenko et al., Sverhtverd. Materialy, 4, 75 (2008).

7. H.Aida, T.Doi, H.Takeda et al., Current Appl. Phys., 12, S41 (2012).

8. W.Xu, X.Lu, G.Pan et al., Appl. Surf. Sci., 256, 3936 (2010).

9. U.S. Patent 4,054,536 (1977).

10. U.S. Patent 4,806,665 (1989).

11. R.K.Iler, The Chemistry of Silica: Solubility, Polymerization, Colloid and Surface Properties and Biochemistry of Silica, A Wiley-Interscience Publication, New York-Chichester-Brisbano-Toronto (1979).

12. A.T.Budnikov, E.A.Vovk, S.I.Krivonogov et al., Functional Materials, 17, 488 (2010).

13. E.A.Vovk, A.T.Budnikov, M.V.Dobrotvotskaya et al., J. Surf. Investig., X-Ray, Synchrotron and Neutron Techn., 6, 115 (2012).

14. J.Eisenlauer, E.Killmann, J. Colloid and Interface Sci., 74, 108 (1980).

15. H.Lei, J.Luo, Wear, 257, 461 (2004).

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