Dependence of the polycrystalline silicon film texture on technological conditions of the film formation

F.D. Kasimov, N.G. Dzhavadov, F.F. Kasimova, N.M. Muradov

Azerbaijan National Aerospace Agency, 159 Azadlyg pr., Baku, 370106 Azerbaijan

Received November 9, 1998

Using X-ray and electron microscopy, polycrystalline silicon films textures have been investigated depending on technological conditions of their formation. The texture and morphology of polysilicon films have been shown to be governed by temperature and duration of seed layer deposition whereon the films are grown.

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