Funct. Mater. 2026; 32 (1): 121-126.

doi:https://doi.org/10.15407/fm33.01.121

Advances in organic field-effect transistors with polymeric gate dielectrics: A short review

K. R. Rajesh1, C. S. Menon2, C. R. Indulal3

1 Post Graduate and Research Department of Physics, Sree Krishna College Guruvayur, affiliated to the University of Calicut, Thrissur, 680102, India
2 School of Pure and Applied Physics, Mahatma Gandhi University, Kottayam, 686560, India
3 Department of Physics, St. Gregorios College, affiliated to the University of Kerala, Kottarakkara, 691531 India

Abstract: 

Organic field-effect transistors (OFETs) have emerged as promising components in flexible and low-cost electronic applications due to their mechanical flexibility, compatibility with solution processing, and the ability to tune electrical properties. A critical element in OFET performance is the gate dielectric, with polymeric dielectrics such as PMMA, PVP, and polystyrene offering notable advantages in terms of processability, dielectric strength, and interface engineering. This review presents a comprehensive analysis of OFETs utilizing polymeric gate dielectrics, with a focus on the deposition of organic semiconductors by spin-coating and thermal evaporation methods. The review discusses how the interaction between polymer dielectrics and semiconductors affects charge transport, interface traps, threshold voltage, and overall device stability. Key device architectures including bottom-gate and top-gate configurations are evaluated, highlighting performance trends and material selection strategies. Finally, new designs such as bilayer dielectrics, organic–inorganic hybrid systems, and low-voltage organic field-effect transistors are considered to address issues related to environmental sensitivity and lifetime. This review aims to guide future research in optimizing material combinations and fabrication techniques to advance the practical application of polymeric-gated OFETs in next-generation electronics.

Keywords: 
organic semiconductors, organic field-effect transistors, organic gate, transistor characteristics
References: 

1. Facchetti, A., Yoon, M. H. and Marks, T. J., Adv. Mater., 17, 1705 (2005).

2. Nketia-Yawson, B. and Noh, Y. Y., Adv. Funct. Mater., 29, 1808423 (2019).

3. Wang, Y., Huang, X., Li, T., Li, L. and Guo, X., Chem. Mater., 31, 4920 (2019).

4. Paterson, A. F., Singh, S., Fallon, K. J. and Hodsden, T., Adv. Mater., 30, 1801079 (2018).

5. Xu, T., Liu, Y., Bu, Y., Shu, S., Fan, S. and Cao, M., Adv. Electron. Mater., 9, 2200984 (2023).

6. Park, S., Kim, S. H., Choi, H. H. and Kang, B., Adv. Funct. Mater., 30, 1904590 (2020).

7. Luo, H., Yu, C., Liu, Z., Zhang, G., Geng, H., Yi, Y. and Broch, K., Sci. Adv., 2, e1600076 (2016).

8. Bulgarevich, K., Sakamoto, K. and Yasuda, T., Adv. Electron. Mater., 6, 2000161 (2020).

9. Baeg, K. J., Noh, Y. Y., Ghim, J. and Lim, B., Adv. Funct. Mater., 31, 2102660 (2021).

10. Rajeev, V. R., Pillai, S. S., Nunzi, J. M. and N. U. K. N., Macromol. Mater. Eng., 307, 2100716 (2021).

11. Noh, Y. Y. and Sirringhaus, H., Org. Electron., 10, 174 (2009).

12. Zhang, F., Zhang, H., Zhu, L., Qin, L. and Wang, Y., J. Mater. Chem. C, 7, 4004 (2019).

13. Sung, Y., Shin, E. Y., Noh, Y. Y. and Lee, J. Y., ACS Appl. Mater. Interfaces, 12, 1537 (2020).

14. Mei, Y., Loth, M. A., Payne, M., Zhang, W., Smith, J., Day, C. S., Parkin, S. R., Heeney, M., McCulloch, I., Anthopoulos, T. D., Anthony, J. E. and Jurchescu, O. D., Adv. Mater., 25, 4352 (2013).

15. Eccher, J., Zajaczkowski, W. and Faria, G. C., ACS Appl. Mater. Interfaces, 7, 20534 (2015).

16. Liu, C., Li, Y., Lee, M. V. and Kumatani, A., Phys. Chem. Chem. Phys., 15, 17756 (2013).

17. Jung, H. J., Shin, Y. J., Park, Y. J. and Yoon, S. C., Adv. Funct. Mater., 20, 1660 (2010).

18. Ukah, N. B., Adil, D., Granstrom, J. et al., Org. Electron., 12, 1247 (2011).

19. Voigt, M. M., Guite, A. and Chung, D. Y., Adv. Funct. Mater., 20, 2390 (2010).

20. Baeg, K. J., Noh, Y. Y. and Sirringhaus, H., Adv. Funct. Mater., 20, 224 (2010).

21. Roichman, Y. and Tessler, N., Appl. Phys. Lett., 80, 151 (2002).

22. Liu, S., Wang, W. M., Briseno, A. L., Mannsfeld, S. C. B. and Bao, Z., Adv. Mater., 21, 1217 (2009).

23. Irimia Vladu, M., Marjanovic, N., Vlad, A. et al., Adv. Mater., 20, 1018 (2008).

24. Eccher, J., Zajaczkowski, W. and Faria, G. C., ACS Appl. Mater. Interfaces, 7, 16374 (2015).

25. Rajesh, K. R. et al., Bull. Mater. Sci., 37, 95 (2014).

26. Unni, K. N., Dabos Seignon, S. and Nunzi, J. M., Chem. Phys. Lett., 421, 554 (2006).

27. Soldano, C., Materials, 14, 3756 (2021).

28. Wang, Y., Huang, X., Li, T., Li, L. and Guo, X., Chem. Mater., 33, 3135 (2021).

29. Nketia Yawson, B. and Noh, Y. Y., Adv. Funct. Mater., 32, 2108664 (2022).

30. Lei, Y., Wu, B., Chan, W. K. E., Zhu, F. and Ong, B. S., J. Mater. Chem. C, 10, 4567 (2022).

31. Baeg, K. J., Facchetti, A. and Noh, Y. Y., J. Mater. Chem., 9, 13895 (2021).

32. Yang, H., Kim, S. H., Yang, L. and Yang, S. Y., Adv. Mater., 33, 2007844 (2021).

33. Yoon, M. H., Kim, C. and Facchetti, A., J. Am. Chem. Soc., 144, 1121 (2022).

34. Baeg, K. J., Noh, Y. Y., Ghim, J. and Lim, B., J. Mater. Chem., 22, 21138 (2012).

35. Cui, T., Liang, G. and Varahramyan, K., IEEE Electron Device Lett., 24, 420 (2003).

36. Noh, Y. Y. and Sirringhaus, H., Org. Electron., 102, 106553 (2022).

37. Eccher, J., Zajaczkowski, W. and Faria, G. C., ACS Appl. Mater. Interfaces, 7, 20534 (2015).

38. Ukah, N. B., Adil, D., Granstrom, J. et al., Org. Electron., 12, 1247 (2011).

39. Voigt, M. M., Guite, A. and Chung, D. Y., Adv. Funct. Mater., 20, 2390 (2010).

40. Irimia Vladu, M., Marjanovic, N., Vlad, A. et al., Adv. Mater., 20, 3573 (2008).

Current number: